plasma ashing of photoresist

plazmocheminis fotorezisto šalinimas statusas T sritis radioelektronika atitikmenys: angl. plasma ashing of photoresist vok. plasmachemische Fotoresistablösung, f rus. плазмохимическое удаление фоторезиста, n pranc. élimination plasmachimique du photorésist, f

Radioelektronikos terminų žodynas. – Vilnius : BĮ UAB „Litimo“. . 2000.

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  • Plasma ashing — In semiconductor manufacturing plasma ashing is the process of removing the photoresist from an etched wafer. Using a plasma source, a monatomic reactive species is generated. Oxygen or fluorine are the most common reactive species. The reactive… …   Wikipedia

  • Ashing — AshingDepending on context, this may refer to plasma ashing, which is used in semiconductor manufacturing and MEMS for removing photoresist, or it may refer to the process below:A test to deduce the amount of ash forming material present in a… …   Wikipedia

  • élimination plasmachimique du photorésist — plazmocheminis fotorezisto šalinimas statusas T sritis radioelektronika atitikmenys: angl. plasma ashing of photoresist vok. plasmachemische Fotoresistablösung, f rus. плазмохимическое удаление фоторезиста, n pranc. élimination plasmachimique du… …   Radioelektronikos terminų žodynas

  • plasmachemische Fotoresistablösung — plazmocheminis fotorezisto šalinimas statusas T sritis radioelektronika atitikmenys: angl. plasma ashing of photoresist vok. plasmachemische Fotoresistablösung, f rus. плазмохимическое удаление фоторезиста, n pranc. élimination plasmachimique du… …   Radioelektronikos terminų žodynas

  • plazmocheminis fotorezisto šalinimas — statusas T sritis radioelektronika atitikmenys: angl. plasma ashing of photoresist vok. plasmachemische Fotoresistablösung, f rus. плазмохимическое удаление фоторезиста, n pranc. élimination plasmachimique du photorésist, f …   Radioelektronikos terminų žodynas

  • плазмохимическое удаление фоторезиста — plazmocheminis fotorezisto šalinimas statusas T sritis radioelektronika atitikmenys: angl. plasma ashing of photoresist vok. plasmachemische Fotoresistablösung, f rus. плазмохимическое удаление фоторезиста, n pranc. élimination plasmachimique du… …   Radioelektronikos terminų žodynas

  • Gravure (micro-fabrication) — La gravure (aussi appelée parfois par son nom anglophone, etching) est un procédé utilisée en micro fabrication, qui consiste à retirer une ou plusieurs couches de matériaux à la surface d un wafer. La gravure est une étape critique, extrêmement… …   Wikipédia en Français

  • Semiconductor device fabrication — Semiconductor manufacturing processes 10 µm 1971 3 µm 1975 1.5 µm 1982 …   Wikipedia

  • Photolithography — For earlier uses of photolithography in printing, see Lithography. For the same process applied to metal, see Photochemical machining. Photolithography (or optical lithography ) is a process used in microfabrication to selectively remove parts of …   Wikipedia

  • Etching (microfabrication) — Etching tanks used to perform Piranha, Hydrofluoric acid or RCA clean on 4 inch wafer batches at LAAS technological facility in Toulouse, France Etching is used in microfabrication to chemically remove layers from the surface of a wafer during… …   Wikipedia

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